| 1 | CNSVKKLM2506025 | AUTOMATIC METROLOGY SEM SYSTEM VERITYSEM 4I, MAKERAPPLIED TOOL ID AV4IB7SD00 ORIGIN US MICAP1303527 P.O.3501317773 INV1998237 | MICRON TECHNOLOGY INC | MICRON TECHNOLOGY TAIWAN, INC. | 10 juil. 2025 | China Taiwan | 5,287 kg | 3 CAS |
| 2 | CNSVKKLM2506022 | AUTOMATIC METROLOGY SEM SYSTEM VERITYSEM 4I, MAKERAPPLIED TOOL ID AV4IBCSB00 ORIGIN US MICAP1303547 P.O.3501317773 INV1993873 | MICRON TECHNOLOGY INC | MICRON TECHNOLOGY TAIWAN, INC. | 10 juil. 2025 | China Taiwan | 5,287 kg | 3 CAS |
| 3 | KLLMJP1150155 | ETCHANT CHEMICAL FOR SEMICONDUCTOR PROCESS . PO# 4515078459 ME-5102 200L DRM 10DRM(S) . HS CODE : 3402.90 | MICRON TECHNOLOGY INC. | UTSU CO.,LTD | 20 juin 2025 | China Taiwan | 2,948 kg | 10 DRM |
| 4 | KLLMJP1150073 | 001 TELIUS SP(TEL DRY TOOL), S N: H00794 . PO NO.3501319639 SHIPDOC NO.1990714 HS CODE :8486.20 001 TELIUS SP(TEL DRY TOOL), S N: H00794 . PO NO.3501319639 SHIPDOC NO.1990714 HS CODE :8486.20 | MICRON TECHNOLOGY INC | MICRON MEMORY JAPAN,K.K | 17 juin 2025 | Japan | 6,440 kg | 9 CAS |
| 5 | CNSVBKEOA5052003 | ASM XP4-EPI 3CH (INTREPID XP-2587-PREV 3INTER-MICRON) MAKERASM, CVD ASM XP4 EPITAXY DEPOS ITION TOOL ORIGIN SG MICAP1529801 PO451515 6846 INV1985429 HS CODE 8486.20 ASM XP4-EPI 3CH (INTREPID XP-2587-PREV 3INTER-MICRON) MAKERASM, CVD ASM XP4 EPITAXY DEPOS ITION TOOL ORIGIN SG MICAP1529801 PO451515 6846 INV1985429 HS CODE 8486.20 ASM XP4-EPI 3CH (INTREPID XP-2587-PREV 3INTER-MICRON) MAKERASM, CVD ASM XP4 EPITAXY DEPOS ITION TOOL ORIGIN SG MICAP1529801 PO451515 6846 INV1985429 HS CODE 8486.20 | MICRON TECHNOLOGY INC | MICRON MEMORY TAIWAN CO., LTD. | 15 juin 2025 | China Taiwan | 13,275 kg | 20 WDC |
| 6 | CNSVBKEOA5052002 | PHOTO PROCESS TOOL MODEL LITHIUS PRO MAKER TEL TOOL ID TPROBC7D00 COUNTRY OF ORIGIN J P MICAP1306164 P.O.3501283679 INV1985021 HS CODE8486.20 PHOTO PROCESS TOOL MODEL LITHIUS PRO MAKER TEL TOOL ID TPROBC7D00 COUNTRY OF ORIGIN J P MICAP1306164 P.O.3501283679 INV1985021 HS CODE8486.20 PHOTO PROCESS TOOL MODEL LITHIUS PRO MAKER TEL TOOL ID TPROBC7D00 COUNTRY OF ORIGIN J P MICAP1306164 P.O.3501283679 INV1985021 HS CODE8486.20 | MICRON TECHNOLOGY INC | MICRON TECHNOLOGY TAIWAN, INC. | 15 juin 2025 | China Taiwan | 14,561 kg | 13 WDC |
| 7 | HDMUSELM696030A1 | SHIPPER LOAD AND COUNT PERFORATED PANEL | MICRON TECHNOLOGY, INC. | SALES COMPANY HYDROSILA | 1 juin 2025 | South Korea | 18,663 kg | 18 PKG |
| 8 | CNSVKKLM2505011 | SEMI- BATCH ALD SYSTEM NT333 12 MODEL TEL N T333 TOOL ID THIKB3N600 MANUFACTURER TOKYO ELECTRON LTD. COUNTRY OF ORIGIN JP MICAP132 3093 P.O.3501317646 INV1980156 SEMI- BATCH ALD SYSTEM NT333 12 MODEL TEL N T333 TOOL ID THIKB3N600 MANUFACTURER TOKYO ELECTRON LTD. COUNTRY OF ORIGIN JP MICAP132 3093 P.O.3501317646 INV1980156 SEMI- BATCH ALD SYSTEM NT333 12 MODEL TEL N T333 TOOL ID THIKB3N600 MANUFACTURER TOKYO ELECTRON LTD. COUNTRY OF ORIGIN JP MICAP132 3093 P.O.3501317646 INV1980156 | MICRON TECHNOLOGY INC | MICRON TECHNOLOGY TAIWAN, INC. | 30 mai 2025 | China Taiwan | 15,748 kg | 11 CAS |
| 9 | KLLMSG2547640 | BRUKER - DIMENSION AFP | MICRON TECHNOLOGY INC | MICRON SEMICONDUCTOR ASIA PTE | 28 mai 2025 | Singapore | 3,126 kg | 4 CRT |
| 10 | KLLMJP1149060 | ETCHANT CHEMICAL FOR SEMICONDUCTOR PROCESS . PO# 4515078459 ME-5102 200L DRM 10DRM(S) HS CODE : 3402.90 | MICRON TECHNOLOGY INC. | UTSU CO.,LTD | 18 mai 2025 | China Taiwan | 2,947 kg | 10 DRM |